EFFECT OF DEPOSITION TIME ON NANOCOLUMNAR TiZrN FILMS GROWN BY REACTIVE MAGNETRON CO-SPUTTERING WITH THE OAD TECHNIQUE
Keywords:
TiZrN film, OAD, reactive co-sputtering, self-annealing effect
Abstract
Well-separated inclined nanocolumnar TiZrN films were grown on silicon-wafer substrates by reactive magnetron co-sputtering with the oblique-angle-deposition (OAD) technique. The crystal structure, thickness, morphology and chemical composition of the prepared TiZrN films were investigated with the X-ray diffraction technique at the grazing-incidence angle (GIXRD), field-emission scanning electron microscopy (FE-SEM) and energy dispersive X-ray spectroscopy (EDS). The length, diameter and tilt angle of the nanocolumnar TiZrN films were evaluated. The microstructure and chemical composition were analyzed with transmission electron microscopy (TEM). The results indicated that the film crystallinity and physical morphology were influenced by the deposition time due to the self-annealing effect, which occurred during the nanocolumnar growth. Moreover, the hardness and surface wettability of the TiZrN films were studied using a nanoindentater and the water-contact-angle method, respectively. It was found that the hardness and hydrophobic surface of the TiZrN films decreased with the increasing deposition time.
References
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17 R. E. Beainou, N. Martin, V. Potin, P. Pedrosa, M. A. P. Yazdi, A. Billard, Correlation between structure and electrical resistivity of W-Cu thin films prepared by GLAD co-sputtering, Surf. Coat., 313 (2017), 1–7, doi:10.1016/j.surfcoat.2017.01.039
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19 W. Phae-ngam, M. Horprathum, C. Chananonnawathorn, T. Ler¬tvanithphol, B. Samransuksamer, P. Songsiriritthigul, H. Nakajima, S. Chaiyakun, Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers, Curr. Appl. Phys., 19 (2019), 894–901, doi:10.1016/j.cap.2019.05.002
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23 P. M. Martin, Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology, Chapter 13, Glancing Angle Deposition, 2010, 621–678
24 J. Lintymer, J. Gavoille, N. Martin, J. Takadoum, Glancing angle deposition to modify microstructure and properties of sputter deposited chromium thin films, Surface and Coatings Technology, 174–175 (2003), 316–323, doi:10.1016/S0257-8972(03)00413-4
25 A. R. Shetty, A. Karimi, Texture mechanisms and microstructure of biaxial thin films grown by oblique angle deposition, Phys. Status Solidi B, 249 (2012) 8, doi.10.1002/pssb.201248010
26 A. R. Shetty, A. Karimi, M. Cantoni, Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAlN thin films, Thin Solid Films, 519 (2011), 4262–4270, doi:10.1016/j.tsf.2011.02.090
27 Y. W. Lin, H. A. Chen, G. P. Yu, J. H. Huan, Effect of Bias on the Structure and Properties of TiZrN Thin Films Deposited by Unbalanced Magnetron Sputtering, Thin Solid Films, 618 (2016), 13–20, doi:10.1016/j.tsf.2016.05.021
28 E. W. Niu, L. Li, G. H. Lv, H. Chen, X. Z. Li, X. Z.Yang, S. Z.Yang, Characterization of Ti–Zr–N films deposited by cathodic vacuum arc with different substrate bias, Applied Surface Science, 254 (2008) 13, 3909–3914, doi:10.1016/j.apsusc.2007.12.022
2 A. Klamchuen, T. Yanagid, M. Kanai, K. Nagashima, K. Oka, S. Rahong, M. Gang, M. Horprathum, M. Suzuki, Y. Hidaka, S. Kai, T. Kawai, Study on transport pathway in oxide nanowire growth by using spacing-controlled regular array, Appl. Phys. Lett., 99 (2011), 193105, doi:10.1063/1.3660246
3 K. Nagashima, T. Yanagida, K. Oka, M. Kanai, A. Klamchuen, S. Rahong, G. Meng, M. Horprathum, B. Xu, F. Zhuge, Y. He, B. H. Park, T. Kawai, Prominent thermodynamical interaction with surroundings on nanoscale memristive switching of metal oxides, Nano Lett., 12 (2012) 11, 5684–5690, doi:10.1021/nl302880a
4 X. M. Cai, F. Ye, S. Y. Jing, D. P. Zhang, E. Q. Xie, A systematic study of chemical vapor deposition growth of InN, Appl. Surf. Sci., 255 (2008), 2153–2158, doi:10.1016/j.apsusc.2008.07.051
5 K. Teker, Density and morphology adjustments of gallium nitride nanowires, Appl. Surf. Sci., 283 (2013), 1065–1070, doi:10.1016/ j.apsusc.2013.07.069
6 L. Yu, Y. Lv, P. Liu, X. Yu, Synthesis of rhombic and triangular cross-sectional AlN nanorods on Si substrate via thermal CVD, Mater. Lett., 65 (2011) 10, 1499–1502, doi:10.1016/j.matlet.2011. 02.052
7 M. Horprathum, T. Srichaiyaperk, B. Samransuksamer, A. Wisitsoraat, P. Eiamchai, S. Limwichean, C. Chananonnawathron, K. Aiempanakit, N. Nuntawong, V. Patthanasettakul, C. Oros, S. Porntheeraphat, P. Songsiriritthigul, H. Nakajima, A. Tuantranont, P. Chindaudom, Ultrasensitive hydrogen sensor based on Pt-decorated WO3 nanorods prepared by glancing-angle dc magnetron sputtering, ACS Appl. Mater. Interfaces, 6 (2014), 22051–22060, doi:10.1021/ am505127g
8 M. Horprathum, K. Limwichean, A. Wisitsoraat, P. Eiamchai, K. Aiempanakit, P. Limnonthakul, N. Nuntawong, V. Patthanasettakul, A. Tuantranont, P. Chindaudom, NO2- sensing properties of WO3 nanorods prepared by glancing angle DC magnetron sputtering, Sens. Actuators B, 176 (2013), 685–691, doi:10.1016/j.snb.2012. 09.077
9 P. Nuchuaya, T. Chaikeereea, M. Horprathum, N. Mungkung, N. Kasayapanand, C. Oros, S. Limwichean, N. Nuntawong, C. Chananonnawathorn, V. Patthanasettakul, P. Muthitamongkol, B. Samransuksamer, S. Denchitcharoen, A. Klamchuen, C. Thana¬chayanont, P. Eiamchai, Engineered omnidirectional antireflection ITO nanorod films with super hydrophobic surface via glancing-angle ion-assisted electron-beam evaporation deposition, Curr. Appl. Phys., 17 (2017), 222–229, doi:10.1016/j.cap.2016.11.018
10 C. Oros, M. Horprathum, A. Wisitsoraat, T. Srichaiyaperk, B. Samransuksamer, S. Limwichean, P. Eiamchai, D. Phokharatkul, N. Nuntawong, C. Chananonnawathron, V. Patthanasettakul, A. Klamchuen, J. Kaewkhao, A. Tuantranont, P. Chindaudom, Ultrasensitive NO2 sensor based on vertically aligned SnO2 nanorods deposited by DC reactive magnetron sputtering with glancing angle deposition technique, Sens. Actuators B, 223 (2016), 936–945, doi:10.1016/j.snb.2015.09.104
11 B. Samransuksamer, M. Horprathum, T. Jutarosaga, A. Kopwitthaya, S. Limwichean, N. Nuntawong, C. Chananonnawathorn, V. Patthanasettakul, P. Muthitamongkol, A. Treetong, A. Klamchuen, A. Leelapojanaporn, C. Thanachayanont, P. Eiamchai, Facile method for decorations of Au nanoparticles on TiO2 nanorod arrays toward high-performance recyclable SERS substrates, Sens. Actuators B, 277 (2018), 102–113, doi:10.1016/j.snb.2018.08.136
12 N. Nuntawong, P. Eiamchai, K. Wong-ek, M. Horprathum, K. Limwichean, V. Patthanasettakul, P. Chindaudom, Shelf time effect on SERS effectiveness of silver nanorod prepared by OAD technique, Vacuum, 88 (2013), 23–27, doi:10.1016/j.vacuum.2012. 08.006
13 A. Siad, A. Besnard, C. Nouveau, P. Jacque, Critical angles in DC magnetron glad thin films, Vacuum, 131 (2016), 305–311, doi:10.1016/j.vacuum.2016.07.012
14 A. Barranco, A. Borras, A. R. Gonzalez-Elipe, A. Palmero, Perspectives on oblique angle deposition of thin films: From fundamentals to devices, Prog. Mater Sci., 76 (2016), 59–153, doi:10.1016/j.pmatsci. 2015.06.003
15 A. R. Shetty, A. Karimi, M. Cantoni, Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAlN thin films, Thin Solid Films, 519 (2011), 4262–4270, doi:10.1016/j.tsf.2011.02.090
16 A. R. Shetty, A. Karimi, Texture mechanisms and microstructure of biaxial thin films grown by oblique angle deposition, Phys. Status Solidi B, 249 (2012) 8, 1531–1540, doi:10.1002/pssb.201248010
17 R. E. Beainou, N. Martin, V. Potin, P. Pedrosa, M. A. P. Yazdi, A. Billard, Correlation between structure and electrical resistivity of W-Cu thin films prepared by GLAD co-sputtering, Surf. Coat., 313 (2017), 1–7, doi:10.1016/j.surfcoat.2017.01.039
18 R. E. Beainou, N. Martin, V. Potin, P. Pedrosa, M. A. P. Yazdi, A. Billard, W-Cu sputtered thin films grown at oblique angles from two sources: Pressure and shielding effects, Surf. Coat. Technol., 343 (2018), 153–159, doi:10.1016/j.surfcoat.2017.09.062
19 W. Phae-ngam, M. Horprathum, C. Chananonnawathorn, T. Ler¬tvanithphol, B. Samransuksamer, P. Songsiriritthigul, H. Nakajima, S. Chaiyakun, Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers, Curr. Appl. Phys., 19 (2019), 894–901, doi:10.1016/j.cap.2019.05.002
20 W. C. Oliver, G. M. Pharr, An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments, J. Mater. Res., 7 (1992), 1564–1583, doi:10.1557/JMR.1992.1564
21 W. C. Oliver, G. M. Pharr, Measurement of hardness and elastic modulus by instrumented indentation: Advances in understanding and refinements to methodology, J. Mater. Res., 19 (2004), 3–20
22 C. Patzig, A. Miessler, T. Karabacak, B. Rauschenbach, Arbitrarily shaped Si nanostructures by glancing angle ion beam sputter deposition, Phys. Status Solidi B, 247 (2010), 1310–1321, doi:10.1002/ pssb.200945525
23 P. M. Martin, Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology, Chapter 13, Glancing Angle Deposition, 2010, 621–678
24 J. Lintymer, J. Gavoille, N. Martin, J. Takadoum, Glancing angle deposition to modify microstructure and properties of sputter deposited chromium thin films, Surface and Coatings Technology, 174–175 (2003), 316–323, doi:10.1016/S0257-8972(03)00413-4
25 A. R. Shetty, A. Karimi, Texture mechanisms and microstructure of biaxial thin films grown by oblique angle deposition, Phys. Status Solidi B, 249 (2012) 8, doi.10.1002/pssb.201248010
26 A. R. Shetty, A. Karimi, M. Cantoni, Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAlN thin films, Thin Solid Films, 519 (2011), 4262–4270, doi:10.1016/j.tsf.2011.02.090
27 Y. W. Lin, H. A. Chen, G. P. Yu, J. H. Huan, Effect of Bias on the Structure and Properties of TiZrN Thin Films Deposited by Unbalanced Magnetron Sputtering, Thin Solid Films, 618 (2016), 13–20, doi:10.1016/j.tsf.2016.05.021
28 E. W. Niu, L. Li, G. H. Lv, H. Chen, X. Z. Li, X. Z.Yang, S. Z.Yang, Characterization of Ti–Zr–N films deposited by cathodic vacuum arc with different substrate bias, Applied Surface Science, 254 (2008) 13, 3909–3914, doi:10.1016/j.apsusc.2007.12.022
Published
2021-03-16
How to Cite
1.
Phae-ngamW, Chananonnawathorn C, Lertvanithphol T, Samransuksamer B, Horprathum M, Chaiyakun T. EFFECT OF DEPOSITION TIME ON NANOCOLUMNAR TiZrN FILMS GROWN BY REACTIVE MAGNETRON CO-SPUTTERING WITH THE OAD TECHNIQUE. MatTech [Internet]. 2021Mar.16 [cited 2026Aug.10];55(1):65-0. Available from: https://mater-tehnol.si/index.php/MatTech/article/view/96
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